AGC / Tosoh (EUV blanks & sputtering targets)
EUV mask-blank & sputtering-target materials
AGC supplies EUV photomask blanks and specialty glass, and (with Tosoh and JX Metals) sputtering targets and ultra-pure metals for deposition. These upstream glass/metal-target materials are narrowly sourced and sit beneath HOYA and the deposition-equipment tier as another concentrated Japanese materials chokepoint.
Products
EUV blanks, sputtering targets
How it fits the stack
AGC / Tosoh (EUV blanks & sputtering targets) with what it depends on (above) and what it feeds (below). The figure renders as a crawlable diagram and upgrades to an interactive 3D graph as it scrolls into view.
AGC / Tosoh (EUV blanks & sputtering targets) in the AI stack. AGC / Tosoh (EUV blanks & sputtering targets) with its immediate upstream dependencies (top) and downstream dependents (bottom) in the AI value chain. Hover a node in 3D, or read the full relationships below.
Graph data (text) — 3 entities, 2 relationships
- Applied Materials —supplies→ AGC / Tosoh (EUV blanks & sputtering targets)
- EUV Lithography (13.5nm) —supplies→ AGC / Tosoh (EUV blanks & sputtering targets)