HOYA (EUV Mask Blanks)
Dominant EUV photomask blank supplier
HOYA supplies the majority of the world's EUV photomask blanks — the ultra-flat, defect-free multilayer substrates on which every EUV chip pattern is written. Together with a small role from AGC and Shin-Etsu, HOYA's EUV blank near-dominance is a severe upstream chokepoint: no blanks, no EUV masks, no leading-edge AI logic. Generic supply-chain maps almost never surface it.
EUV mask blank share
Majority / dominant
Also
Optical glass, endoscopes
How it fits the stack
HOYA (EUV Mask Blanks) with what it depends on (above) and what it feeds (below). The figure renders as a crawlable diagram and upgrades to an interactive 3D graph as it scrolls into view.
HOYA (EUV Mask Blanks) in the AI stack. HOYA (EUV Mask Blanks) with its immediate upstream dependencies (top) and downstream dependents (bottom) in the AI value chain. Hover a node in 3D, or read the full relationships below.
Graph data (text) — 2 entities, 1 relationships
- EUV Lithography (13.5nm) —supplies→ HOYA (EUV Mask Blanks)