Cymer (ASML light source)
EUV light source — laser-produced tin plasma at the heart of every EUV scanner
Cymer, a San Diego company ASML acquired in 2013, develops the EUV light source: a system that fires a high-power CO2 laser at ~50,000 tin droplets per second to create the 13.5nm plasma light. Light-source power and stability were for years the main bottleneck limiting EUV throughput and adoption. As an ASML subsidiary it is a critical, hard-to-replicate node feeding the EUV chokepoint.
Owner
ASML (acquired 2013)
Function
EUV light source (LPP tin plasma)
Droplet rate
~50,000 tin droplets/sec
How it fits the stack
Cymer (ASML light source) with what it depends on (above) and what it feeds (below). The figure renders as a crawlable diagram and upgrades to an interactive 3D graph as it scrolls into view.
Cymer (ASML light source) in the AI stack. Cymer (ASML light source) with its immediate upstream dependencies (top) and downstream dependents (bottom) in the AI value chain. Hover a node in 3D, or read the full relationships below.
Graph data (text) — 4 entities, 3 relationships
- Cymer (ASML light source) —depends on→ TRUMPF
- ASML Holding —depends on→ Cymer (ASML light source)
- EUV Lithography (13.5nm) —supplies→ Cymer (ASML light source)