ASML High-NA EUV (EXE:5000/5200)
0.55-NA next-generation lithography, ~€350M per system
High-NA EUV (numerical aperture 0.55 vs 0.33 for standard EUV) is the successor litho platform enabling sub-2nm scaling with fewer multi-patterning steps. Intel took the first EXE:5000 systems in 2024-2025 for 18A/14A; TSMC and Samsung followed with more caution on cost. Each tool costs roughly double a standard EUV scanner and weighs ~150 tons, cementing ASML's monopoly deeper into the sub-2nm era.
Numerical aperture
0.55
Price
~€350M per system
First customer
Intel (18A/14A)
How it fits the stack
ASML High-NA EUV (EXE:5000/5200) with what it depends on (above) and what it feeds (below). The figure renders as a crawlable diagram and upgrades to an interactive 3D graph as it scrolls into view.
ASML High-NA EUV (EXE:5000/5200) in the AI stack. ASML High-NA EUV (EXE:5000/5200) with its immediate upstream dependencies (top) and downstream dependents (bottom) in the AI value chain. Hover a node in 3D, or read the full relationships below.
Graph data (text) — 5 entities, 4 relationships
- ASML High-NA EUV (EXE:5000/5200) —manufactures→ ASML Holding
- ASML High-NA EUV (EXE:5000/5200) —depends on→ Carl Zeiss SMT
- ASML High-NA EUV (EXE:5000/5200) —depends on→ TRUMPF
- Intel Foundry —uses→ ASML High-NA EUV (EXE:5000/5200)
Depends on ↑ · 3